Patent · US Active

Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus

US9606339B2 · kind B2 · utility

1Cited by

5References

3Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jochen Hetzler · Aalen, DE
Ralf Mueller · Germersheim, DE
Wolfgang Singer · Aalen, DE

Key dates

Filing date	Feb 6, 2012
Grant date	Mar 28, 2017
Priority date	—
Expiry date	Aug 23, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70958
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S′). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S′) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.