Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
US9606429B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
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Key dates
| Filing date | Sep 26, 2014 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Sep 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.