Patent · US Active

Electrostatic chuck

US9608549B2 · kind B2 · utility

3Cited by
8References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 28, 2012
Grant dateMar 28, 2017
Priority date
Expiry dateSep 28, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6833
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Embodiments of electrostatic chucks are provided herein. In some embodiments, an electrostatic chuck for retaining a substrate includes a base plate, a ceramic plate, supported by the base plate, having a substrate supporting surface, a first plurality of electrodes disposed within the ceramic plate having a first polarity, and a second plurality of electrodes disposed within the ceramic plate having a second polarity opposite from the first polarity, wherein the first and second plurality of electrodes are independently controllable to provide a desired chucking power and frequency.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.