Steven V. Sansoni
34Patents
12h-index
70Co-inventors
84Inventor score
Filing activity: Nov 14, 1997 → Jan 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8390980B2 | Electrostatic chuck assembly | Electricity | 169 | Active |
| US6469283B1 | Method and apparatus for reducing thermal gradients within a substrate support | Electricity | 69 | Expired |
| USD893441S1 | Base plate for a processing chamber substrate support | General | 64 | Active |
| US7589950B2 | Detachable electrostatic chuck having sealing assembly | Emerging Cross-Sectional Technologies | 50 | Active |
| USD891382S1 | Process shield for a substrate processing chamber | General | 48 | Active |
| USD933725S1 | Deposition ring for a substrate processing chamber | General | 42 | Active |
| USD425919S | Electrostatic chuck with improved spacing mask and workpiece detection device | General | 41 | Expired |
| USD420022S | Electrostatic chuck with improved spacing and charge migration reduction mask | General | 25 | Expired |
| US5886865A | Method and apparatus for predicting failure of an eletrostatic chuck | Emerging Cross-Sectional Technologies | 21 | Expired |
| USD942516S1 | Process shield for a substrate processing chamber | General | 16 | Active |
| US8559159B2 | Electrostatic chuck and methods of use thereof | Electricity | 16 | Active |
| USD407073S | Electrostatic chuck with improved spacing and charge migration reduction mask | General | 15 | Expired |
| USD947914S1 | Base plate for a processing chamber substrate support | General | 11 | Active |
| USD420023S | Electrostatic chuck with improved spacing mask and workpiece detection device | General | 11 | Expired |
| USD406852S | Electrostatic chuck with improved spacing mask and workpiece detection device | General | 10 | Expired |
| US9425076B2 | Substrate transfer robot end effector | Electricity | 9 | Active |
| US8971009B2 | Electrostatic chuck with temperature control | Electricity | 9 | Active |
| USD960216S1 | Base plate for a processing chamber substrate support | General | 8 | Active |
| US9147592B2 | Linked vacuum processing tools and methods of using the same | Electricity | 7 | Active |
| US9508584B2 | In-situ removable electrostatic chuck | Emerging Cross-Sectional Technologies | 4 | Active |
| US9779971B2 | Methods and apparatus for rapidly cooling a substrate | Electricity | 3 | Active |
| US9608549B2 | Electrostatic chuck | Electricity | 3 | Active |
| US9773692B2 | In-situ removable electrostatic chuck | Emerging Cross-Sectional Technologies | 2 | Active |
| US10704147B2 | Process kit design for in-chamber heater and wafer rotating mechanism | Electricity | 1 | Active |
| US11887878B2 | Detachable biasable electrostatic chuck for high temperature applications | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.