Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
US9612522B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2015 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | May 3, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG08B31/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.