Method and system for design of enhanced edge slope patterns for charged particle beam lithography
US9612530B2 · kind B2 · utility
4Cited by
53References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 11, 2016 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Mar 11, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31771
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for fracturing or mask data preparation are presented in which a set of shots is determined for a multi-beam charged particle beam writer. The edge slope of a pattern formed by the set of shots is calculated. An edge of the pattern which has an edge slope below a target level is identified, and the dosage of a beamlet in a shot in the set of shots is increased to improve the edge slope. The improved edge slope remains less than the target level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.