Ingo Bork
12Patents
5h-index
6Co-inventors
51Inventor score
Filing activity: Feb 28, 2011 → Jul 25, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8473875B2 | Method and system for forming high accuracy patterns using charged particle beam lithography | Physics | 30 | Active |
| US8719739B2 | Method and system for forming patterns using charged particle beam lithography | Physics | 16 | Active |
| US9043734B2 | Method and system for forming high accuracy patterns using charged particle beam lithography | Physics | 13 | Active |
| US9057956B2 | Method and system for design of enhanced edge slope patterns for charged particle beam lithography | Electricity | 9 | Active |
| US9400857B2 | Method and system for forming patterns using charged particle beam lithography | Physics | 5 | Active |
| US9612530B2 | Method and system for design of enhanced edge slope patterns for charged particle beam lithography | Electricity | 4 | Active |
| US9034542B2 | Method and system for forming patterns with charged particle beam lithography | Emerging Cross-Sectional Technologies | 2 | Active |
| US9091946B2 | Method and system for forming non-manhattan patterns using variable shaped beam lithography | Electricity | 1 | Active |
| US8703389B2 | Method and system for forming patterns with charged particle beam lithography | Emerging Cross-Sectional Technologies | 1 | Active |
| US10031413B2 | Method and system for forming patterns using charged particle beam lithography | Physics | 1 | Active |
| US9465297B2 | Method and system for forming patterns with charged particle beam lithography | Emerging Cross-Sectional Technologies | 0 | Active |
| US9164372B2 | Method and system for forming non-manhattan patterns using variable shaped beam lithography | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.