Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets
US9618852B2 · kind B2 · utility
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21References
54Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 14, 2008 |
| Grant date | Apr 11, 2017 |
| Priority date | — |
| Expiry date | Nov 14, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including gas outlets through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlets is controlled so that a pressure of the gas supplied by a first one of the gas outlets is different from a pressure of the gas simultaneously supplied from a second one of the gas outlets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.