Liquid treatment apparatus and liquid treatment method
US9640383B2 · kind B2 · utility
2Cited by
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10Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 11, 2012 |
| Grant date | May 2, 2017 |
| Priority date | — |
| Expiry date | Aug 26, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.