Lithographic apparatus and device manufacturing method
US9645506B2 · kind B2 · utility
0Cited by
20References
20Claims
0Family size
Assignee
Inventors
- Michel Riepen
- Christiaan Alexander Hoogendam
- Paulus Martinus Maria Liebregts
- Ronald Van Der Ham
- Wilhelmus Franciscus Johannes Simons
- Daniel Jozef Maria Direcks
- Paul Petrus Joannes Berkvens
- Eva Mondt
- Gert-Jan Gerardus Johannes Thomas Brands
- Koen Steffens
- Han Henricus Aldegonda Lempens
- Mathieus Anna Karel Van Lierop
- Christophe De Metsenaere
- Marcio Alexandre Cano Miranda
- Patrick Johannes Wilhelmus Spruytenburg
- Joris Johan Anne-Marie Verstraete
- Franciscus Johannes Joseph Janssen
Key dates
| Filing date | Dec 13, 2013 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Nov 20, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.