Pattern fortification for HDD bit patterned media pattern transfer
US9660185B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | May 17, 2016 |
| Grant date | May 23, 2017 |
| Priority date | — |
| Expiry date | May 17, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/16
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for forming a magnetic layer having a pattern of magnetic properties on a substrate is described. The method includes using a metal nitride hardmask layer to pattern the magnetic layer by plasma exposure. The metal nitride layer is patterned using a nanoimprint patterning process with a silicon oxide pattern negative material. The pattern is developed in the metal nitride using a halogen and oxygen containing remote plasma, and is removed after plasma exposure using a caustic wet strip process. All processing is done at low temperatures to avoid thermal damage to magnetic materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.