Substrate holder, polishing apparatus, and polishing method
US9662764B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2013 |
| Grant date | May 30, 2017 |
| Priority date | — |
| Expiry date | Sep 1, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/30
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The substrate holder is a device for holding a substrate and pressing it against a polishing pad. The substrate holder includes: an inner retaining ring vertically movable independently of the top ring body and arranged around the substrate; an inner pressing mechanism to press the inner retaining ring against the polishing surface of the polishing pad; an outer retaining ring to vertically movable independently of the inner retaining ring and the top ring body; an outer pressing mechanism to press the outer retaining ring against the polishing surface; and a supporting mechanism to receive a lateral force applied to the inner retaining ring from the substrate during polishing of the substrate and to tiltably support the outer retaining ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.