Patent · US Active

Method and apparatus for a wafer seal ring

US9673169B2 · kind B2 · utility

1Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 5, 2013
Grant dateJun 6, 2017
Priority date
Expiry dateFeb 5, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/15787
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer seal ring may be formed on a wafer having a pattern structure with a pattern density. The wafer seal ring pattern structure may include a plurality of lines having a width and a spacing that may be approximately equal to a width and a spacing of die bond rings on the wafer. The wafer having the wafer seal ring formed thereon may be bonded to a wafer that may not have a wafer seal ring. A pair of wafers may be formed with respective wafer seal rings formed in a corresponding manner. The pair of wafers may be bonded together with the wafer seal rings aligned and bonded together to form a seal ring structure between the bonded wafers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.