Patent · US Active

Target element types for process parameter metrology

US9678421B2 · kind B2 · utility

19Cited by

4References

22Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Vladimir Levinski · Milpitas, US
Feler Yoel · Haifa, IL
Daniel Kandel · Aseret, IL

Key dates

Filing date	Jul 9, 2015
Grant date	Jun 13, 2017
Priority date	—
Expiry date	Aug 20, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/30
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.