Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
US9678427B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2014 |
| Grant date | Jun 13, 2017 |
| Priority date | — |
| Expiry date | Dec 10, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent.wherein A is a divalent organic group containing a triazine ring, X1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X1 is an —O— group, Z is a divalent group having at least one sulfur atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.