Hiroto OGATA
21Patents
1h-index
21Co-inventors
53Inventor score
Filing activity: Feb 2, 2006 → Jun 10, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7293833B2 | Chair and support mechanism unit thereof | Human Necessities | 52 | Expired |
| US9793131B2 | Pattern forming method using resist underlayer film | Chemistry; Metallurgy | 1 | Active |
| US10437151B2 | Cationically polymerizable resist underlayer film-forming composition | Physics | 1 | Active |
| US11112696B2 | Protective film-forming composition | Electricity | 1 | Active |
| US9678427B2 | Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain | Physics | 1 | Active |
| US12072630B2 | Resist underlayer film-forming composition including cyclic carbonyl compound | Electricity | 0 | Active |
| US12297381B2 | Laminate, release agent composition, and method for manufacturing processed semiconductor substrate | Electricity | 0 | Active |
| US11131928B2 | Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive | Physics | 0 | Active |
| US12215259B2 | Multilayer object and release agent composition | Electricity | 0 | Active |
| US11542366B2 | Composition for forming resist underlayer film and method for forming resist pattern using same | Electricity | 0 | Active |
| US11319514B2 | Composition for forming a coating film for removing foreign matters | Emerging Cross-Sectional Technologies | 0 | Active |
| US10844167B2 | Composition for forming resist underlayer film and method for forming resist pattern using same | Electricity | 0 | Active |
| US11003078B2 | Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method | Electricity | 0 | Active |
| US12386262B2 | Resist underlayer film-forming composition using carbon-oxygen double bond | Chemistry; Metallurgy | 0 | Active |
| US11674051B2 | Stepped substrate coating composition containing compound having curable functional group | Electricity | 0 | Active |
| US12313972B2 | Resist underlayer film-forming composition | Chemistry; Metallurgy | 0 | Active |
| US12044969B2 | Resist underlayer film-forming composition | Chemistry; Metallurgy | 0 | Active |
| US11287741B2 | Resist underlayer film-forming composition | Electricity | 0 | Active |
| US9534140B2 | Resist underlayer film-forming composition | Chemistry; Metallurgy | 0 | Active |
| US12332566B2 | Resist underlayer film-forming composition | Chemistry; Metallurgy | 0 | Active |
| US11635692B2 | Resist underlying film forming composition | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.