Method and device for detecting defects and method and device for observing defects
US9683946B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2013 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Jan 21, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention is suppressing the elongating phenomenon in the dark field image of defects in detecting a minute defect by using a dark field microscope. Provided is a method for detecting defects in which scattered light generated from the sample, is concentrated to form an image and is captured and processed to extract a defect to find the positional information of the defect, and the positional information is output, wherein an image of the scattered light that suppresses the occurrence of the elongating phenomenon is formed for which partial shielding of a component of the forward scattered light, that passes through a region near the outer edge of the field of view of the objective lens, and the positional information for the defect is found from a luminance signal for a defect that is extracted from a captured scattered light image that suppresses the occurrence of the elongating phenomenon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.