Patent · US Active

Carrier substrate and method for producing semiconductor chips

US9704945B2 · kind B2 · utility

5Cited by
5References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 7, 2012
Grant dateJul 11, 2017
Priority date
Expiry dateApr 29, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H29/10
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A carrier substrate includes a first major face and a second major face opposite the first major face. A diode structure is formed between the first major face and the second major face, which diode structure electrically insulates the first major face from the second major face at least with regard to one polarity of an electrical voltage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.