Carrier substrate and method for producing semiconductor chips
US9704945B2 · kind B2 · utility
5Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2012 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Apr 29, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H29/10
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A carrier substrate includes a first major face and a second major face opposite the first major face. A diode structure is formed between the first major face and the second major face, which diode structure electrically insulates the first major face from the second major face at least with regard to one polarity of an electrical voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.