Patent · US Active

Illumination system for lithographic projection exposure step-and-scan apparatus

US9709896B2 · kind B2 · utility

0Cited by

2References

7Claims

0Family size

Assignee

Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

Aijun Zeng · Shanghai, CN
Liqun Chen · Bristol, GB
Ruifang FANG · Shanghai, CN
Huijie Huang · Shanghai, CN

Key dates

Filing date	Dec 30, 2015
Grant date	Jul 18, 2017
Priority date	—
Expiry date	Jan 27, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70075
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Illumination system for a lithographic projection exposure step-and-scan apparatus comprising a light source, a pupil shaping unit, a field defining unit, a first lens array, a first slit array, a second lens array, a third lens array, a second slit array, a fourth lens array, a condenser lens, and a scanning drive unit sequentially arranged along the light beam propagation direction. The illumination system reduces requirements on lens processing, slit scanning speed, and slit scanning precision, therefore may be implemented more easily.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.