Stabilizing EUV light power in an extreme ultraviolet light source
US9713240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2015 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Aug 12, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method includes providing a target material that includes a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; controlling a radiant exposure delivered to the target material from the first beam of radiation to within a predetermined range of radiant exposures; and stabilizing a power of the EUV light emitted from the plasma by controlling the radiant exposure delivered to the target material from the first beam of radiation to within the predetermined range of radiant exposures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.