Patent · US Active

Gas distribution blocker apparatus

US9714465B2 · kind B2 · utility

4Cited by

12References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Lun Tsuei · Dallas, US
Alan Tso · San Jose, US
Tom K. Cho · Palo Alto, US
Brian Sy-Yuan Shieh · Fremont, US

Key dates

Filing date	Nov 30, 2009
Grant date	Jul 25, 2017
Priority date	—
Expiry date	Jan 17, 2035

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P70/50
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure differential of process gases supplied across a showerhead of a processing chamber to provide improved deposition uniformity across the surface of a substrate disposed therein. In one embodiment, a blocker plate is disposed between a backing plate and a showerhead. In one embodiment, the distance between the blocker plate and the showerhead is adjustable. In another embodiment, the blocker plate has a non-planar surface contour. In another embodiment, a regional blocker plate is disposed between a backing plate and a showerhead. In another embodiment, a central blocker plate and a peripheral blocker plate are disposed between a backing plate and a showerhead.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.