Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing method
US9715174B2 · kind B2 · utility
1Cited by
0References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2013 |
| Grant date | Jul 25, 2017 |
| Priority date | — |
| Expiry date | Dec 19, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0027
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.