Patent · US Active

Method of forming a graphene structure

US9716227B2 · kind B2 · utility

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1References

19Claims

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Assignee

Infineon Technologies AG · DE

Inventors

Hans-Joachim Schulze · Taufkirchen, DE
Peter Irsigler · Ried im Innkreis, AT
Guenther Ruhl · Regensburg, DE

Key dates

Filing date	Dec 31, 2014
Grant date	Jul 25, 2017
Priority date	—
Expiry date	Dec 31, 2034

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S977/932
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

In various embodiments, a method of forming a graphene structure is provided. The method may include forming a body including at least one protrusion, and forming a graphene layer at an outer peripheral surface of the at least one protrusion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.