Patent · US Active

Resin composition and pattern forming method using the same

US9718901B2 · kind B2 · utility

3Cited by
11References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 30, 2014
Grant dateAug 1, 2017
Priority date
Expiry dateDec 30, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0388
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1):

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.