Patent · US Active

Wafer edge shape for thin wafer processing

US9721907B2 · kind B2 · utility

1Cited by
1References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 18, 2015
Grant dateAug 1, 2017
Priority date
Expiry dateNov 18, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/304
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer that includes a front surface, a back surface, and an edge between the front surface and the back surface having a curved edge profile between an edge of the front surface and a side face of the edge of the wafer. The edge profile includes a first convex curve that joins the edge of the front surface, a second convex curve that joins the side face, and an intermediate concave curve that joins the first convex curve and the second convex curve.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.