Wafer edge shape for thin wafer processing
US9721907B2 · kind B2 · utility
1Cited by
1References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2015 |
| Grant date | Aug 1, 2017 |
| Priority date | — |
| Expiry date | Nov 18, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/304
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A wafer that includes a front surface, a back surface, and an edge between the front surface and the back surface having a curved edge profile between an edge of the front surface and a side face of the edge of the wafer. The edge profile includes a first convex curve that joins the edge of the front surface, a second convex curve that joins the side face, and an intermediate concave curve that joins the first convex curve and the second convex curve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.