Coating compositions suitable for use with an overcoated photoresist
US9726977B2 · kind B2 · utility
1Cited by
3References
8Claims
0Family size
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Key dates
| Filing date | Feb 8, 2010 |
| Grant date | Aug 8, 2017 |
| Priority date | — |
| Expiry date | Feb 8, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.