Coated retaining ring
US9731399B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 2, 2014 |
| Grant date | Aug 15, 2017 |
| Priority date | — |
| Expiry date | Aug 17, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D165/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.