Extreme ultraviolet capping layer and method of manufacturing and lithography thereof

US9739913B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Cara Beasley · Scotts Valley, US
• Ralf Hofmann · Heidenheim, DE
• Majeed A. Foad · Sunnyvale, US
• Rudy Beckstrom, III · Santa Clara, US

Key dates

• Filing date: Apr 24, 2015
• Grant date: Aug 22, 2017
• Expiry date: Jul 4, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/062
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.