Substrate treatment method, computer readable storage medium and substrate treatment system
US9741583B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2015 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Apr 16, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/943
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate treatment method includes: forming a plurality of circular patterns of a resist film on a substrate; thereafter applying a first block copolymer; then phase-separating the first block copolymer into a hydrophilic polymer and a hydrophobic polymer; thereafter selectively removing the hydrophilic polymer; then selectively removing the resist film from a top of the substrate; thereafter applying a second block copolymer to the substrate; then phase-separating the second block copolymer into a hydrophilic polymer and a hydrophobic polymer; and thereafter selectively removing the hydrophilic polymer from the phase-separated second block copolymer. A ratio of a molecular weight of the hydrophilic polymer in the first block copolymer and the second block copolymer is 20% to 40%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.