Patent · US Active

Sputtering apparatus

US9758862B2 · kind B2 · utility

0Cited by
7References
20Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 3, 2013
Grant dateSep 12, 2017
Priority date
Expiry dateFeb 24, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/345
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

One embodiment is directed to a magnetron assembly comprising a plurality of magnets, and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds the perimeter of the inner portion. The end portions of the linear array comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections of the outer portion. The magnets in each turnaround section are arranged to form at least two or more different curves in the magnetic field that are offset from each along the target rotation axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.