Patent · US Active

Projection exposure apparatus for microlithography comprising an optical distance measurement system

US9759550B2 · kind B2 · utility

1Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Alexander Wolf · Oberkochen, DE
Markus Schwab · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Joachim Hartjes · Aalen, DE

Key dates

Filing date	Jan 16, 2015
Grant date	Sep 12, 2017
Priority date	—
Expiry date	Jan 16, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31777
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus (10) for microlithography has a plurality of optical components (M1-M6) forming an exposure beam path, as well as a distance measurement system (30, 130, 230) configured to measure a distance between at least one of the optical components and a reference element (40, 140, 240). The distance measurement system comprises a frequency comb generator (32, 132, 232), which is configured to generate electromagnetic radiation (36, 236) having a comb-shaped frequency spectrum.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.