Patent · US Active

Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus

US9760019B2 · kind B2 · utility

3Cited by

2References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Boris Bittner · Roth, DE
Holger Walter · Aalen, DE

Key dates

Filing date	Jan 21, 2016
Grant date	Sep 12, 2017
Priority date	—
Expiry date	Apr 1, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/706
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for controlling a microlithographic projection exposure apparatus includes: determining a wavefront error of the projection exposure apparatus; generating a travel vector, suitable for correcting the wavefront error, with travels for each zone of the optical manipulator; establishing a constraint parameter with respect to the travel for at least one zone of the optical manipulator; and checking the travels of the generated travel vector with respect to implementability.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.