Apparatus and method for in-situ cleaning in ion beam apparatus
US9761410B2 · kind B2 · utility
4Cited by
1References
20Claims
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Key dates
| Filing date | Feb 1, 2016 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Feb 1, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/057
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus may include an electrostatic filter having a plurality of electrodes; a voltage supply assembly coupled to the plurality of electrodes; a cleaning ion source disposed between the electrostatic filter and a substrate position, the cleaning ion source generating a plasma during a cleaning mode, wherein a dose of ions exit the cleaning ion source; and a controller having a first component to generate a control signal for controlling the voltage supply assembly, wherein a negative voltage is applied to at least one of the plurality of electrodes when the plasma is generated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.