Alexandre Likhanskii
44Patents
4h-index
43Co-inventors
59Inventor score
Filing activity: Jan 3, 2007 → Mar 3, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7744039B2 | Systems and methods for controlling flows with electrical pulses | Emerging Cross-Sectional Technologies | 13 | Active |
| US9685298B1 | Apparatus and method for contamination control in ion beam apparatus | Electricity | 6 | Active |
| US9230773B1 | Ion beam uniformity control | Electricity | 5 | Active |
| US9478399B2 | Multi-aperture extraction system for angled ion beam | Electricity | 5 | Active |
| US9761410B2 | Apparatus and method for in-situ cleaning in ion beam apparatus | Electricity | 4 | Active |
| US10192727B2 | Electrodynamic mass analysis | Electricity | 4 | Active |
| US10224181B2 | Radio frequency extraction system for charge neutralized ion beam | Electricity | 3 | Active |
| US10068758B2 | Ion mass separation using RF extraction | Electricity | 3 | Active |
| US10665433B2 | Extreme edge uniformity control | Electricity | 3 | Active |
| US9721750B2 | Controlling contamination particle trajectory from a beam-line electrostatic element | Electricity | 3 | Active |
| USD956005S1 | Shaped electrode | General | 3 | Active |
| US10504682B2 | Conductive beam optic containing internal heating element | Electricity | 2 | Active |
| US11127557B1 | Ion source with single-slot tubular cathode | Electricity | 2 | Active |
| US10923306B2 | Ion source with biased extraction plate | Electricity | 2 | Active |
| US10522330B2 | In-situ plasma cleaning of process chamber components | Electricity | 2 | Active |
| US10665415B1 | Apparatus and method for controlling ion beam properties using electrostatic filter | Electricity | 2 | Active |
| US10410844B2 | RF clean system for electrostatic elements | Electricity | 1 | Active |
| US9922795B2 | High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture | Electricity | 1 | Active |
| US10714301B1 | Conductive beam optics for reducing particles in ion implanter | Electricity | 1 | Active |
| US10763072B1 | Apparatus, system and techniques for mass analyzed ion beam | Electricity | 1 | Active |
| US12154753B2 | Device to control uniformity of extracted ion beam | Electricity | 0 | Active |
| US10886098B2 | Electrostatic filter and ion implanter having asymmetric electrostatic configuration | Electricity | 0 | Active |
| US9613777B2 | Uniformity control using adjustable internal antennas | Electricity | 0 | Active |
| US11011343B2 | High-current ion implanter and method for controlling ion beam using high-current ion implanter | Electricity | 0 | Active |
| US10937624B2 | Apparatus and method for controlling ion beam using electrostatic filter | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.