Multi field point aberration parallel metrology device and method for lithographic projection lens
US9766154B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2015 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Mar 25, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multi field point aberration parallel detection device for a lithographic projection lens and a detection method therefor, having a spatial light modulator that is respectively arranged on the object plane and the image plane of the projection lens under test, wherein the object plane spatial light modulator and the image plane spatial light modulator are respectively disposed as an object plane grating set comprising multiple one-dimensional gratings and an image plane grating set comprising multiple two-dimensional gratings via computer programming. The gratings in the object plane grating set and the image plane grating set are conjugate one to another in respect of the projection lens under test, with each pair of conjugate grating being measured for the wave aberration of a field point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.