Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle
US9768041B2 · kind B2 · utility
0Cited by
22References
29Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 12, 2014 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Oct 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68735
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The collection chamber apparatus acts to separate multiple fluids during the wafer processing cycle. Round, fluid collection trays surround the round wafer to collect each individual fluid, recycling them for later reuse. The trays move up and down by use of air cylinders and stack into each other to prevent cross contamination of the other fluids. Two opposing pistons (air cylinders) lift the trays in pairs to form fluid collection chambers. Each collection chamber has a unique drain which enters a separation manifold, flowing into separate tanks for later reuse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.