Method and structure to fabricate a nanoporous membrane
US9768104B1 · kind B1 · utility
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10Claims
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Key dates
| Filing date | Aug 19, 2016 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Aug 19, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76898
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A self-assembled heteroepitaxial oxide nanocomposite film including alternating layers of a first metal oxide having a first melting point and a second metal oxide having a second melting point that differs from the first melting point is formed in an opening formed in a semiconductor substrate. After forming a metal or metal alloy via structure in the semiconductor substrate, first and second thermal treatments are performed to remove each layer of first or second metal oxide providing a nanoporous membrane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.