Mirror, more particularly for a microlithographic projection exposure apparatus

US9785054B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Toralf Gruner · Hennef (Sieg), DE
• Kerstin Hild · Schwäbisch Gmünd, DE

Key dates

• Filing date: Mar 28, 2016
• Grant date: Oct 10, 2017
• Expiry date: Mar 28, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10N30/8554
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting electromagnetic radiation that is incident on the optical effective surface, and at least two piezoelectric layers (16a, 16b, 16c), which are arranged successively between the mirror substrate and the reflection layer stack in the stack direction of the reflection layer stack and to which an electric field can be applied to produce a locally variable deformation, wherein at least one intermediate layer (22a, 22b) made of crystalline material is arranged between the piezoelectric layers (16a, 16b, 16c), wherein the intermediate layer is designed to leave an electric field, which is present in the region of the piezoelectric layers (16a, 16b, 16c) that adjoin the intermediate layer (22a, 22b) in the stack direction of the reflection layer stack (21), substantially uninfluenced.