Titanium-containing film forming compositions for vapor deposition of titanium-containing films

US9790591B2 · kind B2 · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Changhee Ko · Tsukuba, JP
• Julien Gatineau · Ibaraki, JP
• Clément Lansalot-Matras · Tsukuba, JP
• Julien Lieffrig · Soucy, FR
• Hana Ishii · Tsukuba, JP

Key dates

• Filing date: Nov 30, 2015
• Grant date: Oct 17, 2017
• Expiry date: Dec 4, 2035

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4402
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Titanium-containing film forming compositions are disclosed as well as methods of synthesizing the same and methods of forming Titanium-containing films on substrates via vapor deposition processes using the Titanium-containing film forming compositions. The Titanium-containing film forming compositions comprise a precursor having the formula Ti(R5Cp)2(L), wherein each R is independently H, an alkyl group, or R′3Si, with each R′ independently being H or an alkyl group; L is selected from the group consisting of formamidinates (NR,R′-fmd) or amidinates (NR,R′R″-amd).