Ion beam sputtering with ion assisted deposition for coatings on chamber components

US9797037B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Jennifer Y. Sun · Mountain View, US
• Vahid Firouzdor · San Mateo, US
• Biraja P. Kanungo · San Jose, US
• Tom K. Cho · Palo Alto, US
• Vedapuram S. Achutharaman · San Jose, US
• Ying Zhang · Santa Clara, US

Key dates

• Filing date: Jul 15, 2016
• Grant date: Oct 24, 2017
• Expiry date: Jul 15, 2036

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/265
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide has a composition of 40-45 mol % of Y2O3, 5-10 mol % of ZrO2, 35-40 mol % of Er2O3, 5-10 mol % of Gd2O3, and 5-15 mol % of SiO2.