Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity

US9798244B2 · kind B2 · utility

Assignee

• GlobalFoundries Inc. · KY

Inventors

• Arthur Hotzel · Dresden, DE
• Philipp Jaschinsky · Dresden, DE
• Remi Riviere · Schweinhub, DE
• Wolfram Grundke · Dresden, DE

Key dates

• Filing date: Nov 17, 2015
• Grant date: Oct 24, 2017
• Expiry date: May 16, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/70
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Methods, apparatus, and system for minimizing defectivity in top-coat-free immersion photolithography are provided. Embodiments include forming a photomask by defining a first pattern including a main functional pattern in the photomask; and defining a second pattern including a sub-resolution fill pattern in the photomask in areas between or and/or within structures of the first pattern, the fill pattern having a pitch or range of pitches smaller than a minimum resolved pitch of the lithographic exposure and/or at least a part of the sub-resolution structures of the sub-resolution fill pattern not substantially modifying an imaging of any structure of the main functional pattern in the lithographic exposure.