Heat treatment system, heat treatment method, and program
US9799577B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2016 |
| Grant date | Oct 24, 2017 |
| Priority date | — |
| Expiry date | Nov 3, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/10
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A heat treatment system includes a heat treatment condition storing unit that stores a heat treatment condition with respect to a doping processing and a diffusion processing; a model storing unit that stores a model representing a relationship between a change of the heat treatment condition and a change of an impurity concentration in an impurity-doped thin film; a heat treatment unit that forms the impurity-doped thin film under the heat treatment condition; a calculating unit that calculates a heat treatment condition of the doping processing and the diffusion processing that causes the impurity concentration in the impurity-doped film to be included within the predetermined range, based on the impurity concentration in the impurity-doped thin film and the model; and an adjusting unit that adjusts the impurity concentration in the impurity-doped thin film to be included within the predetermined range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.