Illumination device and method for using the same in the projection lithography machine

US9804502B2 · kind B2 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Aijun Zeng · Shanghai, CN
• Yunbo Zhang · Shanghai, CN
• Mingxing Chen · Shanghai, CN
• Ying-Tzung Wang · Hsinchu, TW
• Huijie Huang · Shanghai, CN

Key dates

• Filing date: Dec 30, 2015
• Grant date: Oct 31, 2017
• Expiry date: Feb 19, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7025
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination device comprises a laser source, a beam expander, a micromirror array having a first control system, a fast steering mirror having a second control system, a diaphragm array, a microlens array, an illumination lens group, and a reflection mirror sequentially along the propagation direction of the laser beam. The first control system comprises a first computer controlling each micromirror on the micro-mirror array through the micromirror array controller to rotate in two-dimensional directions so expanded beam forms desired intensity patterns on the diaphragm array after reflected by the micromirror array and fast reflection mirror and a micromirror array controller; the second control system comprises a second computer controlling the reflection mirror of the fast steering mirror to rotate through fast steering mirror controller so created intensity pattern moves relative to the diaphragm array and a fast steering mirror controller. Method for using the illumination device is provided.