Method and apparatus for design of a metrology target
US9804504B2 · kind B2 · utility
6Cited by
10References
20Claims
0Family size
Assignee
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Key dates
| Filing date | May 13, 2016 |
| Grant date | Oct 31, 2017 |
| Priority date | — |
| Expiry date | May 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/18
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.