Apparatus and method of adjusting work-function metal thickness to provide variable threshold voltages in finFETs
US9805982B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 2016 |
| Grant date | Oct 31, 2017 |
| Priority date | — |
| Expiry date | May 17, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/834
Abstract
A method of adjusting work-function metal thickness includes providing a structure having a substrate, the substrate including a longitudinally extending array of fins disposed thereon. Spacers are then formed on sidewalls of fins of the array. Pillars are formed between and adjacent the spacers. A gate having dummy gate material is formed over the structure, the gate extending laterally across the spacers and fins of the array. The dummy gate material and spacers are removed from the gate to form work-function (WF) metal trenches defined by the pillars and fins within the gate. The WF metal trenches have a first trench width. A thickness of the pillars is adjusted to provide a second trench width, different from the first trench width, for the WF metal trenches. A WF metal structure is disposed within the WF metal trenches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.