Patent · US Active

Photon source, metrology apparatus, lithographic system and device manufacturing method

US9814126B2 · kind B2 · utility

5Cited by
4References
26Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 23, 2014
Grant dateNov 7, 2017
Priority date
Expiry dateSep 23, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2201/068
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.