Patent · US Active

Catadioptric projection objective comprising deflection mirrors and projection exposure method

US9817220B2 · kind B2 · utility

0Cited by

14References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Thomas Schicketanz · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE

Key dates

Filing date	Sep 27, 2016
Grant date	Nov 14, 2017
Priority date	—
Expiry date	Sep 27, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70791
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus includes a catadioptric projection objective, an illumination system, a stage, and a control unit. The catadioptric projection objective includes multiple objective parts, and one or more active manipulators coupled to one or more optical elements of the projection objective. The control unit is programmed to cause the one or more active manipulators to act on one or more corresponding optical elements while the stage scans a wafer with respect to an image field to reduce errors in the image at the image field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.