Substrate processing apparatus and substrate processing method
US9818654B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2016 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Jun 2, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0273
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receiving element. Consequently, the number of necessary light irradiating units can be reduced, and the apparatus can be miniaturized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.