Target expansion rate control in an extreme ultraviolet light source
US9820368B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2015 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Jan 30, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0027
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.