Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method
US9823576B2 · kind B2 · utility
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42References
21Claims
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Key dates
| Filing date | Jan 27, 2014 |
| Grant date | Nov 21, 2017 |
| Priority date | — |
| Expiry date | Dec 19, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.